METHOD FOR VERIFYING AND CHOOSING LITHOGRAPHY MODEL

Patent №

US 7,536,670

Granted

2009-05-19

Filed 2005

Owner

INVARIUM, INC.

+1 more

Lab

AI components

2

vision · evo

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11141805

A test mask with both verification structures and calibration structures is provided to enable the formation of an image of at least one verification structure and at least one calibration structure at a plurality of different test site locations under different dose and defocus conditions to allow the calibration structures to be measured and to obtain at least one computational model for optical proximity correction purposes.

VisionEvolutionary computationG03F 7/70616G03F 7/705G03F 7/70516

AI classification

Vision0.70
Evolutionary computation0.65
Machine learning0.01
Planning0.00
Natural language0.00
AI hardware0.00
Speech0.00
Knowledge representation0.00

Ownership

INVARIUM, INC.

assignment · 170100689

CADENCE DESIGN SYSTEMS, INC.

assignment · 211220977

Assignors

PERCIN, GOKHAN, RAMANUJAM, RAM, ZACH, FRANZ XAVER

On an employer assignment, the assignors are typically the inventors.

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