Patent №
US 6,602,728
Granted
2003-08-05
Filed 2001
Owner
INTERNATIONAL BUSINESS MACHINES CORPORATION
Lab
AI components
1
evo
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
09754920
A method for generating an optical proximity correction (OPC) model includes generating a set of correction rules for a wafer design containing at least one of lines and assist features, determining a set of corrections that need to be made over a range of sizes and spaces of the lines and assist features based on the set of correction rules, and creating an optical proximity correction model for correcting the wafer design based on the set of corrections.
AI classification
Ownership
INTERNATIONAL BUSINESS MACHINES CORPORATION
assignment · 114310889
Assignors
LIEBMANN, LARS W., MANSFIELD, SCOTT, WONG, ALFRED K.
On an employer assignment, the assignors are typically the inventors.