RETICLE INSPECTING APPARATUS AND RETICLE INSPECTING METHOD

Patent №

US 7,664,309

Granted

2010-02-16

Filed 2005

Owner

FUJITSU LIMITED

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11320858

The present invention efficiently suppresses a false defect and realizes reticle inspection where a defect can be detected with high detection sensitivity. In a reticle inspecting method, reticle inspection data generated based on reticle design data is captured. Also, drawing position accuracy measurement data of the reticle is captured to obtain a first correction amount for correcting a position accuracy component of the reticle. Based on the first correction amount, the inspection data is corrected. Based on the corrected inspection data, a defect on the reticle is detected.

VisionG06T 7/001G03F 1/84H01L 21/67288H10P 72/0616G06T 2207/30148

AI classification

Vision1.00
Evolutionary computation0.02
Natural language0.01
Knowledge representation0.00
Machine learning0.00
Speech0.00
Planning0.00
AI hardware0.00

Ownership

FUJITSU LIMITED

assignment · 174300190

Assignors

HORIE, TSUTOMU, TOKUMARU, YUICHI

On an employer assignment, the assignors are typically the inventors.

© 2026 NYSGPT2525 LLC