PATTERN MISALIGNMENT MEASUREMENT METHOD, PROGRAM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
Patent №
US 8,090,192
Granted
2012-01-03
Filed 2007
Owner
KABUSHIKI KAISHA TOSHIBA
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
11785782
A pattern misalignment measurement method includes acquiring an inspection image of a composite pattern formed by superposing a plurality of kinds of element patterns on each other, acquiring reference images of at least two kinds of element patterns from reference images which are images of reference patterns of the plurality of kinds of element patterns, performing first matching of each of the acquired reference images with the inspection image, and outputting misalignment between the element patterns in the composite pattern on the basis of the result of the first matching.
AI classification
Ownership
KABUSHIKI KAISHA TOSHIBA
assignment · 195490207
Assignors
MITSUI, TADASHI
On an employer assignment, the assignors are typically the inventors.