SYSTEM AND METHOD FOR CMOS IMAGE SENSING

Patent №

US 7,868,367

Granted

2011-01-11

Filed 2008

Owner

SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

12136568

A system and method for sensing image on CMOS. According to an embodiment, the present invention provide a CMOS image sensing pixel. The pixel includes an n-type substrate, which includes a first width and a first thickness. The pixel also includes a p-type epitaxy layer overlying the n-type substrate. The p-type epitaxy layer includes a second width and a second thickness. The second width is associated with one or more characteristics of a colored light. The pixel additionally includes an n-type layer overlying the p-type epitaxy layer. The n-type layer is associated with a third width and a third thickness. Additionally, the pixel includes an pn junction formed between the p-type epitaxy layer and the n-type layer. Moreover, the pixel includes a control circuit being coupled to the CMOS image sensing pixel.

VisionH10F 39/1825H10F 39/014

AI classification

Vision0.99
AI hardware0.37
Machine learning0.00
Natural language0.00
Evolutionary computation0.00
Knowledge representation0.00
Speech0.00
Planning0.00

Ownership

SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION

assignment · 210880642

Assignors

ZHU, HONG, YANG, JIM

On an employer assignment, the assignors are typically the inventors.

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