Patent №
US 8,280,146
Granted
2012-10-02
Filed 2009
Owner
LUMINESCENT TECHNOLOGIES INC.
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
12475361
A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
AI classification
Vision1.00
AI hardware0.16
Natural language0.01
Speech0.00
Machine learning0.00
Knowledge representation0.00
Planning0.00
Evolutionary computation0.00
Ownership
LUMINESCENT TECHNOLOGIES INC.
assignment · 233340146
Assignors
PREIL, MOSHE E., HEGYI, ALEX N., ABRAMS, DANIEL S.
On an employer assignment, the assignors are typically the inventors.
From the same owner
Film-Growth Model Using Level SetsUS 9,547,233 · 2017DETERMINING SOURCE PATTERNS FOR USE IN PHOTOLITHOGRAPHYUS 8,683,396 · 2014Electron-Beam Image ReconstructionUS 8,653,454 · 2014PHOTO-MASK AND WAFER IMAGE RECONSTRUCTIONUS 8,644,588 · 2014TECHNIQUE FOR REPAIRING A REFLECTIVE PHOTO-MASKUS 8,612,903 · 2013SPATIAL MAP OF MASK-PATTERN DEFECTSUS 8,510,683 · 2013LITHOGRAPHICALLY ENHANCED EDGE DETERMINATIONUS 8,473,878 · 2013EXTENDING THE FIELD OF VIEW OF A MASK-INSPECTION IMAGEUS 8,463,016 · 2013