Patent US 8,942,463

Patent №

US 8,942,463

Granted

Owner

Lab

AI components

1

vision

Assignment

None on record

Dataset

AIPD

2023_r1 edition

Application

14224534

A method for determining an image of a mask pattern in a resist coated on a substrate, the method including determining an aerial image of the mask pattern at substrate level; and convolving the aerial image with at least two orthogonal convolution kernels to determine a resist image that is representative of the mask pattern in the resist.

VisionG06T 3/10G03F 7/705G03F 7/70666G03F 7/70675G06T 7/0004

AI classification

Vision0.86
Machine learning0.05
AI hardware0.03
Natural language0.00
Evolutionary computation0.00
Speech0.00
Planning0.00
Knowledge representation0.00
© 2026 NYSGPT2525 LLC