Patent №
US 8,942,463
Granted
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Owner
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Lab
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AI components
1
vision
Assignment
None on record
Dataset
AIPD
2023_r1 edition
Application
14224534
A method for determining an image of a mask pattern in a resist coated on a substrate, the method including determining an aerial image of the mask pattern at substrate level; and convolving the aerial image with at least two orthogonal convolution kernels to determine a resist image that is representative of the mask pattern in the resist.
AI classification
Vision0.86
Machine learning0.05
AI hardware0.03
Natural language0.00
Evolutionary computation0.00
Speech0.00
Planning0.00
Knowledge representation0.00