PATTERN MATCHING METHOD, APPARATUS AND LINE WIDTH MEASURING MACHINE

Patent №

US 8,994,936

Granted

2015-03-31

Filed 2012

Owner

SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

13806992

The present invention discloses a pattern matching method, which is used in measurement process for line width measuring machine, comprising: reading a standard pattern used for matching on the at least one predetermined position of a measured sample; respectively comparing each standard pattern of the measured sample with prestored multiple designed original images corresponding to the standard pattern; determining that the pattern matching is successful if the standard pattern on the measured sample successfully compares with at least one designed original image, and proceeding with the subsequent line width measurement process; otherwise, determining that the pattern matching is failed. The present invention also discloses a corresponding pattern matching method and a line width measuring machine. According to the embodiment of the present invention, it can improve the accuracy and the success rate of the pattern matching when measuring the line width.

VisionG01N 21/956G01N 21/95607

AI classification

Vision1.00
AI hardware0.01
Knowledge representation0.01
Natural language0.00
Machine learning0.00
Evolutionary computation0.00
Speech0.00
Planning0.00

Ownership

SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

assignment · 295280644

Assignors

LIN, YUNG-YU

On an employer assignment, the assignors are typically the inventors.

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