Patent №
US 8,994,936
Granted
2015-03-31
Filed 2012
Owner
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
13806992
The present invention discloses a pattern matching method, which is used in measurement process for line width measuring machine, comprising: reading a standard pattern used for matching on the at least one predetermined position of a measured sample; respectively comparing each standard pattern of the measured sample with prestored multiple designed original images corresponding to the standard pattern; determining that the pattern matching is successful if the standard pattern on the measured sample successfully compares with at least one designed original image, and proceeding with the subsequent line width measurement process; otherwise, determining that the pattern matching is failed. The present invention also discloses a corresponding pattern matching method and a line width measuring machine. According to the embodiment of the present invention, it can improve the accuracy and the success rate of the pattern matching when measuring the line width.
AI classification
Ownership
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
assignment · 295280644
Assignors
LIN, YUNG-YU
On an employer assignment, the assignors are typically the inventors.