PATTERN DEFECT DETECTION APPARATUS

In a printed substrate inspection apparatus for dividing an inspection objective image into divided areas and comparing divided areas with a plurality of reference images which are included in a standard pattern image, an affect of a positional deviation of the inspection objective image is obviated. A size K of each inspection objective divided area is determined in such a manner that a difference between a positional deviation within each inspection objective divided area and a positional deviation of the inspection objective image does not exceed a quantity corresponding to 1 pixel. Further, a maximum shifting quantity M of the reference images with respect to each inspection objective divided area is set equal to or larger than a positional deviation maximum value of the inspection objective image. A positional deviation of the inspection objective image as a whole does not manifests itself as an inclination or a distortion within each inspection objective divided area. The plurality of reference images include images which correspond to images of the inspection objective divided areas. Hence, comparison inspection is accurate.