Patent №
US 9,099,423
Granted
2015-08-04
Filed 2013
Owner
ASM IP HOLDING B.V.
Lab
—
AI components
1
ml
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
14143719
A method of forming a semiconductor material incorporating an electrical dopant is disclosed. In one aspect, a method of incorporating dopant in a semiconductor film comprises forming a first semiconductor material incorporating the dopant at a first dopant concentration and preferentially etching a portion of the first semiconductor material, wherein etching leaves a first etched semiconductor material incorporating the dopant at a second dopant concentration higher than the first dopant concentration.
AI classification
Ownership
ASM IP HOLDING B.V.
assignment · 318600338
Assignors
WEEKS, KEITH DORAN, TOLLE, JOHN, GOODMAN, MATTHEW G., MEHTA, SANDEEP
On an employer assignment, the assignors are typically the inventors.