METHOD AND SYSTEM FOR OBTAINING OPTICAL PROXIMITY CORRECTION MODEL CALIBRATION DATA

A method may be implemented for obtaining calibration data for use in calibrating an optical proximity correction model. The method may include capturing an image for each portion of a plurality of portions of a wafer to obtain captured images. The method may further include assembling at least portions of the captured images to form an assembled image. The method may further include mapping layout data of the wafer with the assembled image. The method may further include selecting portions of the assembled image based on the layout data of the wafer. The method may further include obtaining data associated with the portions of the assembled image as the calibration data.