LAYOUT PATTERN DECOMPOSITION METHOD

Patent №

US 9,529,254

Granted

2016-12-27

Filed 2014

Owner

UNITED MICROELECTRONICS CORP.

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

14504401

A layout pattern decomposition method includes following steps. A layout pattern is received. The layout pattern includes a plurality of features, and an edge-to-edge space is respectively defined in between two adjacent features. A sum of a width of the edge-to-edge space and a width of the feature on a left side of the edge-to-edge space and a sum of the width of the edge-to-edge space and a width of the feature on a right side of the edge-to-edge space are respectively calculated. The sums and a predetermined value are respectively compared. When any one of the sums is smaller than the predetermined value, the two features on the two sides of the edge-to-edge space are colored by a first color and alternatively a second color. The features including the first color are assigned to a first pattern and the features including the second color to a second pattern.

VisionG03F 1/70G03F 7/70433G03F 7/70466G06F 30/398

AI classification

Vision1.00
Evolutionary computation0.07
AI hardware0.04
Knowledge representation0.01
Planning0.00
Machine learning0.00
Natural language0.00
Speech0.00

Ownership

UNITED MICROELECTRONICS CORP.

assignment · 338670533

Assignors

TANG, CHIH-HSIEN, FAN, YAO-JEN, LIN, CHIN-LUNG

On an employer assignment, the assignors are typically the inventors.

From the same owner

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