METHOD AND APPARATUS FOR LOCALLY DEFORMING AN OPTICAL ELEMENT FOR PHOTOLITHOGRAPHY

Patent №

US 9,606,444

Granted

2017-03-28

Filed 2014

Owner

CARL ZEISS SMS LTD.

Lab

AI components

1

evo

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

14238803

The invention relates to a method for locally deforming an optical element for photolithography in accordance with a predefined deformation form comprising: (a) generating at least one laser pulse having at least one laser beam parameter; and (b) directing the at least one laser pulse onto the optical element, wherein the at least one laser beam parameter of the laser pulse is selected to yield the predefined deformation form.

Evolutionary computationG03F 7/70191B82Y 10/00B82Y 40/00G03F 1/72G03F 7/70025G03F 1/60G03F 7/0002

AI classification

Evolutionary computation0.62
Natural language0.02
Machine learning0.00
AI hardware0.00
Speech0.00
Planning0.00
Vision0.00
Knowledge representation0.00

Ownership

CARL ZEISS SMS LTD.

assignment · 332480174

Assignors

DMITRIEV, VLADIMIR, STERN, URI

On an employer assignment, the assignors are typically the inventors.

From the same owner

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