METHOD OF INSPECTING DEFECTS IN CIRCUIT PATTERN AND SYSTEM FOR CARRYING OUT THE METHOD
Patent №
US 5,146,509
Granted
1992-09-08
Filed 1990
Owner
HITACHI, LTD.
+1 more
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
07575380
A circuit pattern to be inspected is imaged so that an image signal representing the circuit pattern to be inspected is produced. The image signal of the circuit pattern is compared with a reference circuit pattern image signal, wherein a part of the image signal discerned to be different from the latter is detected as a candidate defect, at a rate synchronized with the rate of imaging. A local image signal corresponding to each local image covering a region including every one of detected candidate defects is extracted and stored in a memory device. Thereafter, on the basis of the local image signal read out from the memory device, whether or not the candidate defect concerned is fatally harmful with regard to electrical conductivity is examined at a rate asynchronous with the imaging rate.
AI classification
Ownership
HITACHI, LTD.
assignment · 54310323
HITACHI VIDEO ENGINEERING, INC.
assignment · 54310323
Assignors
HARA, YASUHIKO, KOIZUMI, MITSUYOSHI, KITAMURA, SHIGEKI
On an employer assignment, the assignors are typically the inventors.