METHOD OF INSPECTING DEFECTS IN CIRCUIT PATTERN AND SYSTEM FOR CARRYING OUT THE METHOD

Patent №

US 5,146,509

Granted

1992-09-08

Filed 1990

Owner

HITACHI, LTD.

+1 more

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

07575380

A circuit pattern to be inspected is imaged so that an image signal representing the circuit pattern to be inspected is produced. The image signal of the circuit pattern is compared with a reference circuit pattern image signal, wherein a part of the image signal discerned to be different from the latter is detected as a candidate defect, at a rate synchronized with the rate of imaging. A local image signal corresponding to each local image covering a region including every one of detected candidate defects is extracted and stored in a memory device. Thereafter, on the basis of the local image signal read out from the memory device, whether or not the candidate defect concerned is fatally harmful with regard to electrical conductivity is examined at a rate asynchronous with the imaging rate.

VisionG06T 7/001G01R 31/308G06T 2207/30141

AI classification

Vision1.00
Speech0.00
AI hardware0.00
Machine learning0.00
Natural language0.00
Knowledge representation0.00
Evolutionary computation0.00
Planning0.00

Ownership

HITACHI, LTD.

assignment · 54310323

HITACHI VIDEO ENGINEERING, INC.

assignment · 54310323

Assignors

HARA, YASUHIKO, KOIZUMI, MITSUYOSHI, KITAMURA, SHIGEKI

On an employer assignment, the assignors are typically the inventors.

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