CMOS IMAGE SENSOR AND FABRICATING METHOD THEREOF

Patent №

US 7,705,378

Granted

2010-04-27

Filed 2005

Owner

DONGBUANAM SEMICONDUCTOR INC.

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11319590

A CMOS image sensor and fabricating method thereof can enhance the quality of the image sensor by preventing unnecessary diffused reflection of light by providing an opaque filter layer next to a microlens. The CMOS image sensor includes a photodiode, an insulating interlayer, a metal line, a device protecting layer, a microlens on the device protecting layer and overlapped with the photodiode, and an opaque layer pattern on the device protecting layer next to the microlens.

VisionH10F 39/8063H10F 39/024H10F 39/807

AI classification

Vision0.89
Knowledge representation0.01
Natural language0.01
AI hardware0.00
Evolutionary computation0.00
Machine learning0.00
Speech0.00
Planning0.00

Ownership

DONGBUANAM SEMICONDUCTOR INC.

assignment · 173870817

Assignors

LEE, CHANG EUN

On an employer assignment, the assignors are typically the inventors.

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