LITHOGRAPHY SIMULATION METHOD, PHOTOMASK MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND RECORDING MEDIUM
Patent №
US 7,784,017
Granted
2010-08-24
Filed 2007
Owner
KABUSHIKI KAISHA TOSHIBA
Lab
—
AI components
2
vision · evo
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
11783935
A lithography simulation method includes obtaining a mask transmission function from a mask layout, obtaining an optical image of the mask layout by using the mask transmission function, obtaining a function which is filtered by applying a predetermined function filter to the mask transmission function, and correcting the optical image by using the filtered function.
AI classification
Vision0.97
Evolutionary computation0.70
Natural language0.00
Planning0.00
Speech0.00
Knowledge representation0.00
Machine learning0.00
AI hardware0.00
Ownership
KABUSHIKI KAISHA TOSHIBA
assignment · 195310958
Assignors
SATAKE, MASAKI, TANAKA, SATOSHI
On an employer assignment, the assignors are typically the inventors.
From the same owner
IMAGE PROCESSING APPARATUS FOR CLASSIFYING THREE-DIMENSIONAL DATA INTO CLUSTERS BASED ON RECOGNIZED OBJECTS AND DISTANCESUS 12,693,424 · 2026INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND COMPUTER PROGRAM PRODUCTUS 12,694,304 · 2026DETECTION SYSTEM, PROCESSING APPARATUS, MOVEMENT OBJECT, DETECTION METHOD, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUMUS 12,687,633 · 2026LEARNING CONTROL DEVICE, LEARNING CONTROL METHOD, AND PROGRAM PRODUCT UTILIZING FEEDBACK SIGNALSUS 12,687,822 · 2026HANDLING SYSTEM, CONTROL DEVICE, AND CONTROL METHODUS 12,679,670 · 2026INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND STORAGE MEDIUM FOR PERFORMING EMBEDDING ON DATA OF A GRAPH STRUCTUREUS 12,682,010 · 2026DETECTION APPARATUS, DETECTION METHOD, AND CONVEYANCE SYSTEMUS 12,673,830 · 2026LANGUAGE MODEL TRAINING APPARATUS, LANGUAGE MODEL TRAINING METHOD, AND STORAGE MEDIUMUS 12,675,648 · 2026