SEMICONDUCTOR MEMORY DEVICE

This disclosure concerns a semiconductor memory device including Fin semiconductors extending in a first direction; source layers provided in the Fin semiconductors; drain layers provided in the Fin semiconductors; floating bodies provided in the Fin semiconductors between the source layers and the drain layers, the floating bodies being in an electrically floating state and accumulating or discharging carries so as to store data; first gate electrodes provided in first grooves located between the Fin semiconductors adjacent to each other; second gate electrodes provided in second grooves adjacent to the first grooves and located between the Fin semiconductors adjacent to each other; bit lines connected to the drain layers, and extending in a first direction; word lines connected to the first gate electrodes, and extending in a second direction orthogonal to the first direction; and source lines connected to the source layers, and extending in the second direction.