Patent №
US 9,501,601
Granted
2016-11-22
Filed 2013
Owner
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Lab
—
AI components
2
planning · evo
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
14059328
A method for feature pattern modification includes extracting both a main pattern and a cut pattern from a design pattern, the main pattern being laid out under a set of process guidelines that improve the process window during formation of the main pattern, and modifying at least one of: the main pattern and the cut pattern if either feature pattern is in violation of a layout rule.
AI classification
Ownership
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
assignment · 314470040
Assignors
CHANG, SHIH-MING, LU, KUEI-LIANG, CHANG, SHIH-MING, LU, KUEI-LIANG
On an employer assignment, the assignors are typically the inventors.