METHOD OF FLASH MEMORY DESIGN WITH DIFFERENTIAL CELL FOR BETTER ENDURANCE

Patent №

US 8,320,193

Granted

2012-11-27

Filed 2010

Owner

SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION

+1 more

Lab

AI components

1

hardware

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

12794697

A flash memory system includes a first flash memory cell having a first floating gate, a first source region, and a first control gate. The first control gate is connected to a word line. The first flash memory cell includes a first oxide layer separating the first control gate from the first floating gate and a first drain region connecting to a first bit line. The flash memory system also includes a second flash memory cell having a second floating gate, a second source region, and a second control gate. The second control gate is connected to the word line. The second flash memory cell includes a second oxide layer separating the second control gate from the second floating gate and a second drain region connecting to a second bit line. A comparator processes a first and second input signals received from the respective first and second bit lines.

AI hardwareG11C 16/0441G11C 16/10

AI classification

AI hardware0.85
Speech0.00
Machine learning0.00
Natural language0.00
Knowledge representation0.00
Vision0.00
Planning0.00
Evolutionary computation0.00

Ownership

SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION

assignment · 245000778

SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION

assignment · 296250763

Assignors

LUO, WENZHE, OUYANG, PAUL

On an employer assignment, the assignors are typically the inventors.

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